Oxidation of Monolayer WS$_{2}$ in Ambient is a Photoinduced Process
Jimmy C. Kotsakidis, Quianhui Zhang, Amadeo L. Vazquez de Parga, Marc, Currie, Kristian Helmerson, D. Kurt Gaskill, Michael S. Fuhrer

TL;DR
This study reveals that monolayer WS2 undergoes photoinduced oxidation in ambient conditions, especially under light energies above the trion excitation threshold, impacting its stability and measurement in research and applications.
Contribution
It demonstrates that ambient oxidation of WS2 is driven by photo-oxidation linked to specific photon energies, with detailed analysis of the process and its dependence on illumination conditions.
Findings
Oxidation correlates with high-symmetry, sulfur-vacancy-rich areas.
Oxidation occurs rapidly under light above the trion energy.
Dark storage prevents oxidation for up to 10 months.
Abstract
We have studied the ambient air oxidation of chemical vapor deposition (CVD) grown monolayers of the semiconducting transition metal dichalcogenide (S-TMD) WS using optical microscopy, laser scanning confocal microscopy (LSCM), photoluminescence (PL) spectroscopy, and atomic force microscopy (AFM). Monolayer WS exposed to ambient conditions in the presence of light (typical laboratory ambient light for weeks, or typical PL spectroscopy map), exhibits damage due to oxidation which can be detected with the LSCM and AFM; though may not be evident in conventional optical microscopy due to poorer contrast and resolution. Additionally, this oxidation was not random, and correlated with 'high-symmetry' and red-shifted areas in the PL spectroscopy map - areas thought to contain a higher concentration of sulfur vacancies. In contrast, samples kept in ambient and darkness showed no…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
