# Ferroelectric ZrO$_{2}$ monolayers as buffer layers between SrTiO$_{3}$   and Si

**Authors:** Mehmet Dogan, Sohrab Ismail-Beigi

arXiv: 1903.11716 · 2019-06-27

## TL;DR

This study demonstrates that ferroelectric ZrO₂ monolayers can serve as effective buffer layers to induce and control ferroelectricity in adjacent oxides like SrTiO₃ on silicon, with properties highly dependent on oxygen content.

## Contribution

It reveals how ZrO₂ monolayers influence ferroelectric behavior and interface chemistry, enabling new device architectures with tailored oxide properties.

## Key findings

- ZrO₂ monolayers exhibit multiple stable polarization states.
- Oxygen content critically affects polarization and interface chemistry.
- ZrO₂ buffer layers can induce ferroelectricity in SrTiO₃.

## Abstract

A monolayer of ZrO$_{2}$ has recently been grown on the Si(001) surface and shown to have ferroelectric properties, which signifies the realization of the lowest possible thickness in ferroelectric oxides [M. Dogan et al., Nano Lett., 18 (1) (2018)]. In our previous computational study, we reported on the multiple (meta)stable configurations of ZrO$_{2}$ monolayers on Si, and how switching between a pair of differently polarized configurations may explain the observed ferroelectric behavior of these films [M. Dogan and S. Ismail-Beigi, arXiv:1902.01022 (2019)]. In the current study, we conduct a DFT-based investigation of (i) the effect of oxygen content on the ionic polarization of the oxide, and (ii) the role of zirconia monolayers as buffer layers between silicon and a thicker oxide film that is normally paraelectric on silicon, e.g. SrTiO$_{3}$. We find that (i) total energy-vs-polarization behavior of the monolayers, as well as interface chemistry, is highly dependent on the oxygen content; and (ii) SrTiO$_{3}$/ZrO$_{2}$/Si stacks exhibit multiple (meta)stable configurations and polarization profiles, i.e. zirconia monolayers can induce ferroelectricity in oxides such as SrTiO$_{3}$ when used as a buffer layer. This may enable a robust non-volatile device architecture where the thickness of the gate oxide (here strontium titanate) can be chosen according to the desired properties.

## Full text

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## Figures

10 figures with captions in the complete paper: https://tomesphere.com/paper/1903.11716/full.md

## References

29 references — full list in the complete paper: https://tomesphere.com/paper/1903.11716/full.md

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Source: https://tomesphere.com/paper/1903.11716