# Particle dynamics in deposition of porous films with a pulsed radio-frequency atmospheric pressure glow discharge

## TL;DR

This study investigates how nanoparticles behave during the deposition of porous TiO2 films in a pulsed RF plasma, revealing particle trapping, movement, and film formation mechanisms through experiments and simulations.

## Contribution

It provides new insights into particle dynamics and film deposition processes in pulsed RF plasma, combining experimental observations with numerical modeling.

## Key findings

- Particles are trapped in the sheath during plasma-on phase.
- Residual ions drive particles to the substrate during plasma-off phase.
- Porous TiO2 films are successfully formed through controlled plasma modulation.

## Abstract

Nanoparticles grown in a plasma are used to visualize the process of film deposition in a pulsed radio-frequency (rf) atmospheric pressure glow discharge. Modulating the plasma makes it possible to successfully prepare porous TiO2 films. We study the trapping of the particles in the sheath during the plasma-on phase and compare it with numerical simulations. During the plasma-off phase, the particles are driven to the substrate by the electric field generated by residual ions, leading to the formation of porous TiO2 film. Using video microscopy, the collective dynamics of particles in the whole process is revealed at the most fundamental "kinetic" level.