Micro-Structuring, Ablation and Defect Generation in Graphene with Femtosecond Pulses
Andres Vasquez, Panagis Samolis, Junjie Zeng, Michelle Y Sander

TL;DR
This paper investigates how femtosecond laser pulses can precisely modify or ablate single-layer graphene, revealing thresholds and defect structures that enable micro- and nano-scale patterning for advanced device fabrication.
Contribution
It demonstrates controlled ablation and defect generation in graphene using femtosecond pulses, providing insights into laser parameters for tailored material modifications.
Findings
Low ablation threshold of ~9.2 mJ/cm2 for graphene.
Defect regions extend ~2 um from ablated edges with defect spacing ~58 nm.
Modification at 75% of threshold maintains structure while introducing nanoscale defects.
Abstract
Femtosecond micromachining offers a contact-free and mask-less technique for material patterning. With ultrafast laser irradiation, permanent modifications to the properties of single layer graphene through material ablation or defect introduction can be induced. Multiple femtosecond pulse interactions with a single layer graphene are studied and a low laser ablation threshold ~9.2 mJ/cm2 is reported for a 15 second illumination time. Clean ablated structures are generated in such a multi pulse irradiation configuration at low pulse energies as an attractive alternative to ablation with single femtosecond, high energy pulses. For a fully ablated graphene hole, a radially symmetric region extending around 2 um from the ablated edge is characterized by strong defect generation. Average distances between point-defects down to ~58 nm are derived and Raman spectroscopy implies that overall…
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