Near-field imaging beyond the probe aperture limit
Eunsung Seo, Young-Ho Jin, Wonjun Choi, Yonghyeon Jo, Suyeon Lee,, Kyung-Deok Song, Joonmo Ahn, Q-Han Park, Myung-Ki Kim, Wonshik Choi

TL;DR
This paper introduces a method to surpass the physical probe size limit in near-field optical microscopy by extracting high-order eigenmodes through a phase-referenced transmission matrix, enabling resolution of features smaller than the probe aperture.
Contribution
The authors develop a self-interference near-field microscopy technique that reveals high-order near-field eigenmodes, enhancing resolution beyond the probe aperture limit.
Findings
Resolved nano-slots with 50 nm gaps smaller than the probe size
Successfully extracted high-order eigenmodes using SVD of the FNTM
Enhanced near-field imaging resolution beyond traditional limits
Abstract
Near-field scanning optical microscopy has been an indispensable tool for designing, characterizing and understanding the functionalities of diverse nanoscale photonic devices. As the advances in fabrication technology have driven the devices smaller and smaller, the demand has grown steadily for improving its resolving power, which is determined mainly by the size of the probe attached to the scanner. The use of a smaller probe has been a straightforward approach to increase the resolving power, but it cannot be made arbitrarily small in practice due to the steep reduction of the collection efficiency. Here, we develop a method to enhance the resolving power of near-field imaging beyond the limit set by the physical size of the probe aperture. The main working principle is to unveil high-order near-field eigenmodes invisible with conventional near-field microscopy. The destructive…
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Taxonomy
TopicsNear-Field Optical Microscopy · Integrated Circuits and Semiconductor Failure Analysis · Electromagnetic Compatibility and Measurements
