GPU Acceleration of Real-Time Control Loops
Mohamed A. Bamakhrama, Alejandro Arrizabalaga, Frank Overman,, Jean-Paul Smeets, Kornel van der Sommen, Remko van der Vossen, John, Wagensveld

TL;DR
This paper presents a GPU-accelerated real-time control system for EUV lithography, using advanced techniques like compression and mixed-precision arithmetic to meet strict computational timing requirements.
Contribution
It introduces a novel combination of GPU techniques to enable real-time wafer deformation compensation in EUV lithography.
Findings
Achieved 33 GB/s decompression throughput on NVIDIA P100 GPUs.
Sustained 198 GFLOP/s for mixed-precision dense matrix-vector multiplication.
Demonstrated feasibility of GPU-based real-time control in EUV lithography.
Abstract
Extreme Ultraviolet (EUV) photolithography is seen as the key enabler for increasing transistor density in the next decade. In EUV lithography, 13.5 nm EUV light is illuminated through a reticle, holding a pattern to be printed, onto a silicon wafer. This process is performed about 100 times per wafer, at a rate of over a hundred wafers an hour. During this process, a certain percentage of the light energy is converted into heat in the wafer. In turn, this heat causes the wafer to deform which increases the overlay error, and as a result, reduces the manufacturing yield. To alleviate this, we propose a firm real-time control system that uses a wafer heat feed-forward model to compensate for the wafer deformation. The model calculates the expected wafer deformation, and then, compensates for that by adjusting the light projection and/or the wafer movement. However, the model…
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Taxonomy
TopicsParallel Computing and Optimization Techniques · Advancements in Photolithography Techniques · Numerical Methods and Algorithms
