Deal-Grove Oxidation and Nanoparticle Adhesion - an AFM Study

TL;DR

This study investigates nanoparticle oxidation and adhesion using AFM, revealing that oxide layer growth follows the Deal-Grove model and affects surface adhesion and chemical structure, with implications for silicon surface applications.

Contribution

It demonstrates that nanoparticle oxidation and adhesion are governed by the Deal-Grove model and are correlated, impacting surface properties in silicon-based processes.

Findings

Oxide layer height follows Deal-Grove model

Adhesion forces correlate with oxide height

Surface remains chemically altered after nanoparticle removal

Abstract

We study the formation of nanometer thick oxide layers around nanoparticles (plateaus) in a wet nitrogen environment over 32 days. We determine both the plateau height and the lateral force needed to remove the particles with an atomic force microscope (AFM). The height is well described by the Deal-Grove model for a thermally activated diffusion limited oxidation process. Furthermore, we observe that height and force appear to be correlated suggesting that the rise in adhesion forces is mainly governed by an oxidation process. Since the plateaus are the result of a change in the chemical structure, the surface remains permanently altered even after the removal of the nanoparticles. This observation is of great importance for many applications requiring smooth silicon surfaces, such as photolithography, where small contamination can cause the observed oxidation process and significantly increase the surface roughness.