Revealing the Physico-Chemical Basis of Organic Solid-Solid Wetting Deposition: Casimir-Like Forces, Hydrophobic Collapse, and the Role of the Zeta Potential
Alexander Eberle, Thomas Markert, Frank Trixler

TL;DR
This paper develops a detailed physico-chemical model for organic solid-solid wetting deposition (OSWD), highlighting the roles of zeta potential, Casimir-like forces, and hydrophobic effects, enabling better control of monolayer growth.
Contribution
It introduces a comprehensive model for OSWD based on experimental and theoretical insights, emphasizing the influence of zeta potential and fluctuation-induced forces.
Findings
Zeta potential is crucial in OSWD process.
Casimir-like forces influence organic molecule deposition.
Model allows improved control over monolayer formation.
Abstract
Supramolecular self-assembly at the solid-solid interface enables the deposition and monolayer formation of insoluble organic semiconductors under ambient conditions. The underlying process, termed as the Organic Solid-Solid Wetting Deposition (OSWD), generates two-dimensional adsorbates directly from dispersed three-dimensional organic crystals. This straightforward process has important implications in various fields of research and technology, such as in the domains of low-dimensional crystal engineering, the chemical doping and band-gap engineering of graphene, and in the area of field-effect transistor fabrication. However, till date, lack of an in-depth understanding of the physico-chemical basis of the OSWD prevented the identification of important parameters, essential to achieve a better control of the growth of monolayers and supramolecular assemblies with defined structures,…
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