Ultrathin film of 3D topological insulators by vapor-phase epitaxy: Surface dominant transport in wide temperature revealed by Seebeck measurement
Stephane Yu Matsushita, Khuong Kim Huynh, and Katsumi Tanigaki

TL;DR
This study demonstrates surface-dominant electronic transport in ultrathin Bi2-xSbxTe3-ySey films below 14 nm thickness, using transport and Seebeck measurements to distinguish surface from bulk contributions in 3D topological insulators.
Contribution
It provides a systematic analysis of surface versus bulk transport in topological insulator films, highlighting the Seebeck coefficient as a tool to evaluate surface carrier concentration.
Findings
Surface dominant transport occurs below 14 nm thickness.
Seebeck coefficient reveals intrinsic surface carrier concentration.
Carrier mobility differences cause sign inconsistency between R_H^2D and S.
Abstract
Realization of intrinsic surface dominant transport in a wide temperature region for a topological insulators (TIs) is an important frontier research in order to promote the progresses of TIs towards the future electronics. We report here systematic measurements of longitudinal electrical transport, Shubnikov-de-Haas (SdH) quantum oscillations, Hall coefficient (R_H^2D), and Seebeck coefficient as a function of film thickness (d) and temperature using high quality Bi2-xSbxTe3-ySey (BSTS) single crystal thin films grown by physical vapor-phase deposition. The thickness dependence of sheet conductance and Seebeck coefficient clearly show the suppression of semiconducting hole carriers of bulk states by reducing film thickness, reaching to the surface dominant transport at below dc=14 nm. Quantitative arguments are made as to how the contribution of itinerant carrier number (n) can be…
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