Induced spin-orbit coupling in silicon thin films by bismuth doping
F.Rortais, S.Lee, R.Ohshima, S.Dushenko, Y.Ando, M.Shiraishi (Kyoto, Univ.)

TL;DR
This paper demonstrates that doping silicon thin films with bismuth significantly enhances spin-orbit coupling, enabling tunable spin properties crucial for spintronic applications.
Contribution
The study provides experimental evidence that heavy metal doping, specifically with bismuth, can effectively increase and tune the spin-orbit coupling in silicon thin films.
Findings
Bi doping changes magnetoconductance from weak localization to crossover with weak antilocalization.
The spin-orbit coupling length becomes comparable to the phase coherence length at 2 K.
Spin-orbit coupling in Si can be controlled via heavy metal doping.
Abstract
We demonstrate an enhancement of the spin-orbit coupling in silicon (Si) thin films by doping with bismuth (Bi), a heavy metal, using ion implantation. Quantum corrections to conductance at low temperature in phosphorous-doped Si before and after Bi implantation is measured to probe the increase of the spin-orbit coupling, and a clear modification of magnetoconductance signals is observed: Bi doping changes magnetoconductance from weak localization to the crossover between weak localization and weak antilocalization. The elastic diffusion length, phase coherence length and spin-orbit coupling length in Si with and without Bi implantation are estimated, and the spin-orbit coupling length after the Bi doping becomes the same order of magnitude (Lso = 54 nm) with the phase coherence length (L{\phi} = 35 nm) at 2 K. This is an experimental proof that the spin-orbit coupling strength in Si…
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