Identifying substitutional oxygen as a prolific point defect in monolayer transition metal dichalcogenides with experiment and theory
Sara Barja, Sivan Refaely-Abramson, Bruno Schuler, Diana Y. Qiu, Artem, Pulkin, Sebastian Wickenburg, Hyejin Ryu, Miguel M. Ugeda, Christoph Kastl,, Christopher Chen, Choongyu Hwang, Adam Schwartzberg, Shaul Aloni, Sung-Kwan, Mo, D. Frank Ogletree, Michael F. Crommie

TL;DR
This study combines experimental microscopy and advanced theoretical calculations to identify substitutional oxygen as the prevalent point defect in 2D transition metal dichalcogenides, challenging the common assumption of chalcogen vacancies.
Contribution
It provides the first direct experimental and theoretical evidence that substitutional oxygen, not vacancies, dominates in 2D TMDs under standard conditions.
Findings
No in-gap states observed for chalcogen defects
Substitutional oxygen identified as the main defect
Chalcogen vacancies are less common than previously thought
Abstract
Chalcogen vacancies are considered to be the most abundant point defects in two-dimensional (2D) transition-metal dichalcogenide (TMD) semiconductors, and predicted to result in deep in-gap states (IGS). As a result, important features in the optical response of 2D-TMDs have typically been attributed to chalcogen vacancies, with indirect support from Transmission Electron Microscopy (TEM) and Scanning Tunneling Microscopy (STM) images. However, TEM imaging measurements do not provide direct access to the electronic structure of individual defects; and while Scanning Tunneling Spectroscopy (STS) is a direct probe of local electronic structure, the interpretation of the chemical nature of atomically-resolved STM images of point defects in 2D-TMDs can be ambiguous. As a result, the assignment of point defects as vacancies or substitutional atoms of different kinds in 2D-TMDs, and their…
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