Effect of impurities on morphology and growth mode of (111) and (001) epitaxial-like ScN films
Arnaud le Febvrier, Nina Tureson, Nina Stilkerich, Grzegorz, Greczynski, Per Eklund

TL;DR
This study investigates how deposition conditions influence oxygen contamination and growth modes in epitaxial-like ScN films, affecting their electrical properties and potential applications in thermoelectrics and piezoelectrics.
Contribution
It provides new insights into controlling oxygen contamination and growth modes in ScN films to optimize their electrical properties.
Findings
Lowest resistivity achieved was 50 micro-ohm cm.
Optimal growth at 950°C with minimal twin domains.
Oxygen contamination correlates with adatom mobility during growth.
Abstract
ScN material is an emerging semiconductor with an indirect bandgap. It has attracted attention for its thermoelectric properties, use as seed layers, and for alloys for piezoelectric application. ScN or other transition metal nitride semiconductors used for their interesting electrical properties are sensitive to contaminants, such as oxygen or fluorine. In this present article, the influence of depositions conditions on the amount of oxygen contaminants incorporated in ScN films were investigated and their effects on the electrical properties (electrical resistivity and Seebeck coefficient) were studied. The epitaxial-like films of thickness 125 +-5 nm to 155 +-5 nm were deposited by D.C.-magnetron sputtering on c-plane Al2O3, MgO(111) and r-plane Al2O3 at a substrate temperature ranging from 700 to 950 degree C. The amount of oxygen contaminants presents in the film, dissolved into…
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