Point defects and dopants of boron arsenide from first-principles calculations: donor compensation and doping asymmetry
Sieun Chae, Kelsey Mengle, John T. Heron, Emmanouil Kioupakis

TL;DR
This study uses first-principles calculations to analyze point defects and dopants in boron arsenide, revealing native defect dominance, p-type conduction tendencies, and the effects of impurities on doping asymmetry.
Contribution
It provides detailed formation energies and charge transition levels for native defects and dopants in boron arsenide, highlighting the mechanisms behind doping asymmetry and defect compensation.
Findings
Native boron-related defects dominate intrinsic defect landscape.
Certain impurities like Be_B, Si_As, and Ge_As are effective shallow acceptors.
Donor passivation is likely due to native defects and impurities.
Abstract
We apply hybrid density functional theory calculations to identify the formation energies and thermodynamic charge transition levels of native point defects, common impurities, and shallow dopants in BAs. We find that boron-related defects such as V_B, B_As, B_i-V_B complexes, and antisite pairs are the dominant intrinsic defects. Native BAs is expected to exhibit p-type conduction due to the acceptor-type characteristics of V_B and B_As. Among the common impurities we explored, we found that C substitutional defects and H interstitials have relatively low formation energies and are likely to contribute free holes. Interstitial hydrogen is surprisingly also found to be stable in the neutral charge state. Be_B, Si_As and Ge_As are predicted to be excellent shallow acceptors with low ionization energy (< 0.03 eV) and negligible compensation by other point defects considered here. On the…
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Taxonomy
TopicsBoron and Carbon Nanomaterials Research · Semiconductor materials and interfaces · 2D Materials and Applications
