Improved graphene blisters by ultrahigh pressure sealing

TL;DR

This paper demonstrates that applying ultrahigh pressure with an AFM tip to graphene on SiO2 micro-cavities significantly reduces gas leakage by enhancing adhesion, improving graphene's performance as a gas membrane.

Contribution

The study introduces a simple ultrahigh pressure technique to improve graphene-SiO2 adhesion, substantially decreasing leak rates in graphene-based nanomechanical devices.

Findings

Leak rates reduced by up to 4 times

Ultrahigh pressure enhances graphene-SiO2 adhesion

Method improves graphene membrane performance

Abstract

Graphene is a very attractive material for nanomechanical devices and membrane applications. Graphene blisters based on silicon oxide micro-cavities are a simple but relevant example of nanoactuators. A drawback of this experimental set up is that gas leakage through the graphene-SiO2 interface contributes significantly to the total leak rate. Here we study the diffusion of air from pressurized graphene drumheads on SiO2 micro-cavities and propose a straightforward method to improve the already strong adhesion between graphene and the underlying SiO2 substrate, resulting in reduced leak rates. This is carried out by applying controlled and localized ultrahigh pressure (> 10 GPa) with an Atomic Force Microscopy diamond tip. With this procedure, we are able to significantly approach the graphene layer to the SiO2 surface around the drumheads, thus enhancing the interaction between them allowing us to better seal the graphene-SiO2 interface, which is reflected in up to ~ 4 times lower leakage rates. Our work opens an easy way to improve the performance of graphene as a gas membrane on a technological relevant substrate such as SiO2.