On fast charged particles scattering in a thin crystalline undulator
N.F. Shul'ga, V.I.Truten'

TL;DR
This paper analyzes how fast charged particles scatter in a thin bent crystalline undulator, highlighting effects like volume reflection and beam profile modification through simulations and potential applications.
Contribution
It presents a detailed analysis and simulation of particle scattering in a thin crystalline undulator, revealing effects like multiple volume reflection and beam profile control.
Findings
Multiple volume reflection observed for both positive and negative particles
Significant beam profile changes achievable with small crystalline undulators
Incoherent scattering effects incorporated into particle motion analysis
Abstract
The scattering of fast charged particles in a thin crystalline undulator is considered under conditions when all particles of the beam undergo above-barrier motion with respect to the bent crystalline atomic planes. The consideration is based on the analysis of the particles motion in the continuous potential field of the bent crystal atomic planes and on the simulation of the scattering process taking into account the influence of incoherent effects in scattering on the particles motion. The possibility of manifestation of the effect of multiple volume reflection from bent crystalline atomic planes both for positively and negatively charged particles is shown. The possibility of the beam profiles significant change by means of a small size crystalline undulator is demonstrated.
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