Molecular Signature of Polyoxometalates in Electron Transport of Silicon-based Molecular Junctions
Maxime Laurans, Kevin Dalla Francesca, Florence Volatron, Guillaume, Izzet, David Guerin, Dominique Vuillaume, Stephane Lenfant, Anna Proust

TL;DR
This study demonstrates the covalent immobilization of polyoxometalates on silicon substrates and characterizes their electron transport properties, revealing their potential for molecular electronic applications.
Contribution
It reports the synthesis and covalent attachment of novel POM hybrids with remote diazonium groups and analyzes their electron transport behavior in silicon-based junctions.
Findings
Polyoxometalates show distinct tunneling barriers of 1.6-1.8 eV.
Homogeneous monolayers confirmed by electron transport measurements.
Molecular electronic signatures are evident in solid-state electrical properties.
Abstract
Polyoxometalates (POMs) are unconventional electro-active molecules with a great potential for applications in molecular memories, providing efficient processing steps onto electrodes are available. The synthesis of the organic-inorganic polyoxometalate hybrids [PMO(Sn(CH)CC(CH)N)] (M = Mo, W) endowed with a remote diazonium function is reported together with their covalent immobilization onto hydrogenated n-Si(100) substrates. Electron transport measurements through the resulting densely-packed monolayers contacted with a mercury drop as a top electrode confirms their homogeneity. Adjustment of the current-voltage curves with the Simmons equation gives a mean tunnel energy barrier of 1.8 eV and 1.6 eV, for the Silicon-Molecules-Metal (SMM) junctions based on the polyoxotungstates (M = W) and polyoxomolybdates (M = Mo), respectively. This…
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