Mott metal-insulator transitions in pressurized layered trichalcogenides
Heung-Sik Kim, David Vanderbilt, Kristjan Haule

TL;DR
This study investigates pressure-induced Mott metal-insulator transitions in layered transition metal phosphorous trichalcogenides, revealing distinct structural responses linked to orbital degrees of freedom, with implications for ultrafast electronic switching.
Contribution
It provides the first detailed ab-initio analysis of Mott transitions in $M{ m P}X_3$ compounds, highlighting the role of orbital types in structural and electronic phase changes.
Findings
MnPS$_3$ undergoes an isosymmetric structural transition with Mn-Mn dimer formation.
NiPS$_3$ and NiPSe$_3$ exhibit bandwidth-controlled Mott transitions without structural change.
Ni-based compounds are promising for ultrafast resistivity switching applications.
Abstract
Transition metal phosphorous trichalcogenides, ( and being transition metal and chalcogen elements respectively), have been the focus of substantial interest recently because of their possible magnetism in the two-dimensional limit. Here we investigate material properties of the compounds with = Mn and Ni employing density functional and dynamical mean-field calculations, especially their electronic behavior under external pressure in the paramagnetic phase. Mott metal-insulator transitions (MIT) are found to be a common feature for both compounds, but their lattice structures show drastically different behaviors depending on the relevant orbital degrees of freedom, i.e. or . MnPS undergoes an isosymmetric structural transition by forming Mn-Mn dimers due to the strong direct overlap between the neighboring $t_{\rm…
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