On observation of dispersion in tunable second-order nonlinearities of silicon-rich nitride thin films
Hung-Hsi Lin, Rajat Sharma, Alex Friedman, Benjamin M. Cromey, Felipe, Vallini, Matthew W. Puckett, Khanh Kieu, and Yeshaiahu Fainman

TL;DR
This paper reports on the tunable second-order nonlinearities in silicon-rich nitride films, demonstrating significant electric field-induced enhancement and highlighting the dispersive nature of their nonlinear coefficients for potential telecommunication applications.
Contribution
It provides experimental measurements of in silicon-rich nitride films and explores their tunability via EFISH, revealing their dispersive behavior and implications for integrated photonics.
Findings
as high as 8 pm/V in as-deposited films
Maximum of 22.7 pm/V achieved with EFISH
Dispersive nature of coefficients observed
Abstract
We present experimental results on second-harmonic generation in non-stoichiometric, silicon-rich nitride (SRN) films. The as-deposited film presents a second-order nonlinear coefficient, or \c{hi}(2), as high as 8pm/V. This value can be widely tuned using the electric field induced second harmonic effect (EFISH), and a maximum value of 22.7pm/V was achieved with this technique. We further illustrate that the second-order nonlinear coefficient exhibited by these films can be highly dispersive in nature, and requires further study and analysis to evaluate their viability for in-waveguide applications at telecommunication wavelengths.
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Taxonomy
TopicsAdvanced Fiber Laser Technologies · Photonic and Optical Devices · Acoustic Wave Resonator Technologies
