Context-Aware DFM Rule Analysis and Scoring Using Machine Learning
Vikas Tripathi, Valerio Perez, Yongfu Li, Zhao Chuan Lee, I-Lun Tseng,, and Jonathan Ong

TL;DR
This paper introduces a machine learning-based method for more accurate DFM rule scoring by analyzing layout context and predicting lithography impacts, improving manufacturability evaluation in physical design.
Contribution
It presents a novel machine learning approach that considers layout context for DFM scoring, addressing the limitations of rule-based methods.
Findings
Machine learning improves DFM score accuracy
Context-aware analysis enhances manufacturability predictions
Method outperforms traditional rule-based scoring
Abstract
To evaluate the quality of physical layout designs in terms of manufacturability, DFM rule scoring techniques have been widely used in physical design and physical verification phases. However, one major drawback of conventional DFM rule scoring methodologies is that resultant DFM rule scores may not accurate since the scores may not highly correspond to lithography simulation results. For instance, conventional DFM rule scoring methodologies usually use rule-based techniques to compute scores without considering neighboring geometric scenarios of targeted layout shapes. That can lead to inaccurate scoring results since computed DFM rule scores can be either too optimistic or too pessimistic. Therefore, in this paper, we propose a novel approach with the use of machine learning technology to analyze the context of targeted layouts and predict their lithography impacts on…
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Taxonomy
TopicsAdvancements in Photolithography Techniques · Manufacturing Process and Optimization · Injection Molding Process and Properties
