Grey-box Process Control Mining for Anomaly Monitoring and Deconstruction
Andr\'es Vargas, MD Ridwan Al Iqbal, John S. Erickson, Kristin P., Bennett

TL;DR
This paper introduces a grey-box anomaly detection method for smart manufacturing that combines physical process models with statistical analysis to improve detection and interpretability of anomalies in semiconductor wafer production.
Contribution
The paper presents a novel grey-box approach that integrates control system physics with Bayesian regression to derive shape signatures for anomaly detection and source identification.
Findings
Effective anomaly detection in wafer manufacturing processes.
Ability to deconstruct anomaly scores to identify contributing parameters.
Enhanced process insight through shape signature analysis.
Abstract
We present a new "grey-box" approach to anomaly detection in smart manufacturing. The approach is designed for tools run by control systems which execute recipe steps to produce semiconductor wafers. Multiple streaming sensors capture trace data to guide the control systems and for quality control. These control systems are typically PI controllers which can be modeled as an ordinary differential equation (ODE) coupled with a control equation, capturing the physics of the process. The ODE "white-box" models capture physical causal relationships that can be used in simulations to determine how the process will react to changes in control parameters, but they have limited utility for anomaly detection. Many "black-box" approaches exist for anomaly detection in manufacturing, but they typically do not exploit the underlying process control. The proposed "grey-box" approach uses the…
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Taxonomy
TopicsFault Detection and Control Systems · Advanced Statistical Process Monitoring · Anomaly Detection Techniques and Applications
