Controlled integration of MoS2 flakes on nanopores by means of electrophoretic deposition

TL;DR

This paper introduces a simple, robust electrophoretic method for precisely integrating MoS2 flakes onto plasmonic nanostructures, enabling advanced hybrid optoelectronic applications.

Contribution

It presents a novel controlled deposition technique for 2D materials on complex plasmonic nanostructures, applicable to both flat and 3D geometries.

Findings

Successful decoration of nanostructures with MoS2 layers.

Significant interaction between plasmonic fields and 2D layers.

Potential for enhanced light emission and sensing applications.

Abstract

We propose an easy and robust strategy for the versatile integration of 2D material flakes on plasmonic nanoholes by means of controlled deposition of MoS2 via electrophoretic process. The method can be applied both to simple metallic flat nanostructures and to complex 3D metallic structures both comprising nanoholes. The deposition method allows the decoration of large ordered arrays of plasmonic structures with single or few layers of MoS2. We show that the plasmonic field generated by the nanohole can interact significantly with the 2D layer, thus representing an ideal system for hybrid 2D-Material/Plasmonic investigation. The controlled and ordered integration of 2D materials on plasmonic nanostructures opens a pathway towards, for instance, enhanced light emission; strong coupling from plasmonic hybrid structures; hot electron generation; and sensors based on 2D materials.