Silicon formation in bulk silica through femtosecond laser engraving
Charles M. P\'epin, Erica Block, Richard Gaal, Julien Nillon, Clemens, Hoenninger, Philippe Gillet, Yves Bellouard

TL;DR
This paper demonstrates that femtosecond laser pulses can induce silicon formation within bulk silica by causing ion separation and crystallization, enabling direct-write 3D silicon micro-devices in silica substrates.
Contribution
It reveals a new mechanism of silicon formation in silica via femtosecond laser irradiation, facilitating 3D silicon micro-structure fabrication without microexplosions.
Findings
Silicon micro-crystallites form in silica after femtosecond laser irradiation.
The process occurs without confined microexplosion and at moderate numerical aperture.
This enables direct-write 3D silicon structures within silica.
Abstract
Non-linear absorption phenomena induced by controlled irradiation with a femtosecond laser beam can be used to tailor materials properties within the bulk of substrates. One of the most successful applications of this technique is the ability to fabricate three-dimensional micro-devices integrating optical, mechanical or fluid handling functions in a single substrate. In this context, amorphous SiO2 is the most widely studied material. Here we show that short (50-fs) femtosecond pulses induce the separation of Si and O ions in SiO2 substrates, leading to the formation of micro-crystallites that we identify as pure crystalline phase of Si. Interestingly, this polymorphic phase transformation occurs in the absence of laser-induced confined microexplosion and with moderate numerical aperture. These findings not only unravel a key mechanism related to the transformation of the material and…
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Taxonomy
TopicsLaser Material Processing Techniques · Advanced Surface Polishing Techniques · Diamond and Carbon-based Materials Research
