Nano-structured thin films growth in stochastic plasma-condensate systems

TL;DR

This paper develops a stochastic model for plasma-condensate thin film growth, demonstrating how flux fluctuations influence surface pattern formation and morphology control.

Contribution

It introduces a novel stochastic framework accounting for anisotropic adatom transfer and flux fluctuations in plasma-condensate systems.

Findings

Surface morphology can be controlled by flux fluctuation intensity.

Pattern formation dynamics are governed by stochastic parameters.

Surface structures' size and type depend on fluctuation levels.

Abstract

We derive the stochastic model of plasma-condensate systems by taking into account anisotropy in transference of adatoms between neighbor layers and by introducing fluctuations of adsorbate flux. We show, that by varying the fluctuation's intensity on can govern dynamics of pattern formation on intermediate layer of multi-layer plasma-condensate system. It is shown that the morphology of the growing surface, type of surface structures and their linear size can be controlled by the intensity of the adsorbate flux fluctuations.