Full field electron spectromicroscopy applied to ferroelectric materials
N. Barrett, J. E. Rault, J. L. Wang, C. Mathieu, A. Locatelli, T. O., Mentes, M. A. Nino, S. Fusil, M. Bibes, A. Barthelemy, D. Sando, W. Ren, S., Prosandeev, L. Bellaiche, B. Vilquin, A. Petraru, I. P. Krug, and C. M., Schneider
TL;DR
This paper reviews how PEEM and LEEM electron microscopy techniques are used to analyze the electronic, chemical, and structural properties of ferroelectric materials at nanometer resolution.
Contribution
It provides a comprehensive overview of applying PEEM and LEEM to ferroelectric materials, highlighting their capabilities in surface and band structure analysis.
Findings
High spatial resolution imaging of ferroelectric surfaces
Mapping of surface charge and work function
Analysis of ferroelectric thin films and crystals
Abstract
The application of PhotoEmission Electron Microscopy (PEEM) and Low Energy Electron Microscopy (LEEM) techniques to the study of the electronic and chemical structure of ferroelectric materials is reviewed. Electron optics in both techniques gives spatial resolution of a few tens of nanometres. PEEM images photoelectrons whereas LEEM images reflected and elastically backscattered electrons. Both PEEM and LEEM can be used in direct and reciprocal space imaging. Together, they provide access to surface charge, work function, topography, chemical mapping, surface crystallinity and band structure. Examples of applications for the study of ferroelectric thin films and single crystals are presented.
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