First-principles calculations of iron-hydrogen reactions in silicon
Paulo Santos, Jos\'e Coutinho, Sven \"Oberg

TL;DR
This study uses first-principles calculations to investigate how hydrogen interacts with iron impurities in silicon, revealing insights into defect structures, electronic levels, and implications for silicon contamination control.
Contribution
It provides detailed computational analysis of FeH complexes in silicon, clarifying their electronic properties and stability, which was previously not well understood.
Findings
Fe_iH pair has a migration barrier similar to Fe_i
Fe_iH_2 acts as a hole trap at E_v+0.32 eV
Fe_sH complexes are deep acceptors with little impact on minority carriers
Abstract
Controlling the contamination of silicon materials by iron, especially dissolved interstitial iron (Fe), is a longstanding problem with recent developments and several open issues. Among these we have the question whether hydrogen can assist iron diffusion, or if significant amounts of substitutional iron (Fe) can be created. Using density functional calculations we explore the structure, formation energies, binding energies, migration, and electronic levels of several FeH complexes in Si. We find that a weakly bound FeH pair has a migration barrier close to that of isolated Fe and a donor level at ~eV. Conversely, FeH is estimated at ~eV. These findings suggest that the hole trap at ~eV measured by capacitance measurements should be…
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