Diffusion modeling for Dip-pen Nanolithography
Apoorv Kulkarni

TL;DR
This paper develops a generalized diffusion model for dip-pen nanolithography, accounting for various ink types and environmental factors, to better understand and predict the ink deposition process at the nanoscale.
Contribution
It introduces a comprehensive diffusion model that unifies different ink behaviors and environmental effects in dip-pen nanolithography.
Findings
Model captures effects of humidity and flow rate.
Applicable to multiple ink types including fluid, thiol, and polymer.
Provides a foundation for improved nanolithography precision.
Abstract
The diffusion model for the dip pen nanolithography is similar to spreading an ink drop on a paper. Nanolithography uses Atomic Probe Microscope like probes to deliver the ink drop on to the substrate. The model considers the ink to be molecular. Some models have been developed considering fluid ink, some with thiol inks, particulate inks and polymer inks. The models consider the fluid ink with the added factors such as flow rate, detachment rate, effect due to relative humidity, multilayer flow, the ink drop, with meniscus etc., which makes the model complicated. The aim of this paper is to create a generalized diffusion model
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsNanofabrication and Lithography Techniques · Force Microscopy Techniques and Applications · Advancements in Photolithography Techniques
