Considerations for utilizing sodium chloride in epitaxial molybdenum disulfide

TL;DR

This study compares alkali-assisted and alkali-free epitaxial growth of MoS2, revealing that NaCl increases domain size but introduces heterogeneities and degrades electronic and optical properties due to altered adatom mobility and interface effects.

Contribution

It provides the first direct comparison of alkali-assisted and alkali-free MoS2 growth, highlighting NaCl's impact on domain size, heterogeneity, and device performance.

Findings

NaCl increases MoS2 domain size by 20 times

NaCl induces optical and electronic heterogeneities

NaCl-assisted growth causes >1% tensile strain and reduces photoluminescence

Abstract

The utilization of alkali salts, such as NaCl and KI, have enabled the successful growth of large single domain and fully coalesced polycrystalline two-dimensional (2D) transition metal dichalcogenide layers. However, the impact of alkali salts on photonic and electronic properties are not fully established. In this work, we report alkali-free epitaxy of MoS2 on sapphire and benchmark the properties against alkali-assisted growth of MoS2. This study demonstrates that although NaCl can dramatically increase the domain size of monolayer MoS2 by 20 times, it can also induce strong optical and electronic heterogeneities in as-grown large-scale films. This work elucidates that utilization of NaCl can lead to variation in growth rates, loss of epitaxy, and a high density of nanoscale MoS2 particles (4/{\mu}m2). Such phenomena suggest that alkali atoms play an important role in Mo and S adatom mobility and strongly influence the 2D/sapphire interface during growth. Compared to alkali-free synthesis under the same growth conditions, MoS2 growth assisted by NaCl results in >1% tensile strain in as-grown domains, which reduces photoluminescence by ~20x and degrades transistor performance.