Angle dependent localized surface plasmon resonance from silver nanoparticles embedded in SiO2 thin film

TL;DR

This paper investigates the angle-dependent localized surface plasmon resonance in silver nanoparticles embedded in SiO2 thin films, using ion implantation, microscopy, and transfer matrix simulations to analyze optical properties and nanoparticle behavior.

Contribution

It demonstrates a method to create embedded silver nanoparticles via ion implantation without annealing and clarifies the LSPR features through combined experimental and simulation approaches.

Findings

Identification of LSPR near 400nm in reflectance spectra

Verification of angle-dependent reflectance with simulations

Prediction of electric field enhancement at nanoparticle surfaces

Abstract

Near surface silver nanoparticles embedded in silicon oxide were obtained by 40 keV silver negative ion implantation without the requirement of an annealing step. Ion beam induced local heating within the film leads to an exo-diffusion of the silver ions towards the film surface resulting in the protrusion of larger nanoparticles. Cross-sectional transmission electron microscopy (XTEM) reveals the presence of poly-disperse nanoparticles (NPs), ranging between 2 nm-20 nm, at different depths of the SiO2 film. The normal incidence reflectance spectrum shows a double kink feature in the vicinity of 400nm, indicating a strong localized surface plasmon resonance (LSPR) from the embedded NPs. However, due to overlap of the bilayer interference and LSPR, the related features are difficult to separate. The ambiguity in associating the correct kink with the LSPR related absorption is cleared with the use of transfer matrix simulations in combination with an effective medium approximation. The simulations are further verified with angle dependent reflectance measurements. Additionally, transfer matrix simulation is also used to calculate the electric field intensity profile through the depth of the film, wherein an enhanced electric field intensity is predicted at the surface of the implanted films.