Transient Phenomena in Sub-Band Gap Impact Ionization in Si NIPIN Diode
Bhaskar Das, J. Schulze, Udayan Ganguly

TL;DR
This paper investigates the transient behavior of sub-band-gap impact ionization in Si NIPIN diodes, revealing the underlying leakage mechanisms, current relationships, and the role of hot electrons in the process.
Contribution
It provides the first detailed experimental analysis of transient SBG impact ionization in NIPIN diodes, including leakage mechanisms and the universal current dependence.
Findings
Leakage dominated by recombination-generation and over-the-barrier mechanisms.
Impact ionization current is independent of electric field and linearly related to drain current.
Hot electrons facilitate impact ionization through an Auger-like energy transfer process.
Abstract
Sub-band-gap (SBG) impact ionization (II) enables steep subthreshold slope that enables devices to overcome the thermal limit of 60mV/decade. This phenomenon at low voltage enables various applications in logic, memory and neuromorphic engineering. Recently, we have demonstrated sub-0.2V II in NIPIN diode experimentally primarily based on the steady-state analysis. In this paper, we present the detailed experimental transient behavior of SBG-II in NIPIN. The SBG-II generated holes are stored in the p-well. First, we extract the leakage mechanism from the p-well to show two mechanisms (i) recombination-generation (RG) and (ii) over the barrier (OTB) where OTB dominates when barrier height . Second, we analytically extract the SBG II current (Iii) at 300K from experimental results. The drain current (Id), the electric field (E-field), and Iii are plotted in time. We…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
