Investigation of the Thermal Stability of the Carbon Framework of Graphene Oxide

TL;DR

This study investigates the thermal stability of the carbon framework in graphene oxide, revealing that a newly prepared ai-GO remains stable up to 100°C and improves in quality after mild annealing, unlike conventional GO.

Contribution

First assessment of the thermal stability of the carbon framework in ai-GO, showing enhanced stability and quality compared to traditional GO methods.

Findings

ai-GO remains stable up to 100°C in thin films

Annealing at 50°C improves ai-GO quality before reduction

Conventional GO begins decomposing at 50°C

Abstract

In this study, we use our recently prepared graphene oxide (GO) with an almost intact {\sigma}-framework of C-atoms (ai-GO) to probe the thermal stability of the carbon framework for the first time. Ai-GO exhibits few defects only by preventing CO2 formation during synthesis. Ai-GO was thermally treated before chemical reduction and subsequently the resulting defect density in graphene was determined by statistical Raman microscopy. Surprisingly, the carbon framework of ai-GO is stable in thin films up to 100 {\deg}C. Furthermore, we find evidence for an increasing quality of ai-GO upon annealing at 50 {\deg}C before reduction. The carbon framework of GO prepared according to the popular Hummers method (GO-c)appears to be less stable and decomposition starts at 50 {\deg}C what is qualitatively indicated by CO2-trapping experiments in {\mu}m-thin films. Information about the stability of GO is important for storing, processing and applying GO in applications.