The chemical potential and the work function of a metal film on a dielectric substrate

TL;DR

This paper calculates the chemical potential and work function of an aluminum film on a dielectric substrate using a non-interacting electron model, accurately accounting for electroneutrality, showing these properties approach bulk values as film thickness increases.

Contribution

It introduces a novel calculation method that correctly incorporates electroneutrality in modeling metal films on dielectric substrates.

Findings

Values approach bulk as thickness increases

Electroneutrality significantly affects calculations

Model applies to aluminum films on dielectrics

Abstract

The chemical potential and the work function of an aluminum film, which (1) is in vacuum and (2) is located on a dielectric substrate is calculated within the model of non-interacting electrons located in an asymmetric rectangular potential well. For the first time in calculating these values for such a model of a metal film, the electroneutrality condition is correctly taken into account. This leads to the correct behavior of these values, namely: if the thickness of the film increases, these characteristics tend to their bulk values.