Giant enhancement in Rashba spin-Seebeck effect in NiFe/p-Si thin films
Ravindra G. Bhardwaj, Paul C Lou, Sandeep Kumar

TL;DR
This paper reports a giant Rashba spin-Seebeck effect in NiFe/p-Si thin films, with significantly enhanced spin-Seebeck coefficients and voltages, advancing thermoelectric energy conversion using earth-abundant materials.
Contribution
Demonstrated a record-high Rashba spin-Seebeck effect in NiFe/p-Si bilayers, showing large coefficients and voltages, and highlighting potential for waste heat recovery.
Findings
Spin-Seebeck coefficient up to 2.11 μV/K in 5 nm p-Si
Largest reported spin-Seebeck voltage of 100.3 μV
Significant enhancement with thinner p-Si layers
Abstract
The spin-Seebeck effect mediated thermoelectric energy conversion can provide efficient alternative to traditional thermoelectrics for waste heat recovery. To achieve this goal, efficient spin to charge conversion using earth-abundant materials is essential. Proximity induced Rashba effect arises from the charge potential mediated by structural inversion asymmetry, which has been reported in Si thin films and can be manipulated by controlling the thickness of Rashba layer. We demonstrate a giant Rashba spin-Seebeck effect in NiFe/p-Si (polycrystalline) bilayer thin films. The bilayer thin film specimens have p-Si layer thickness of 5 nm, 25 nm and 100 nm while keeping the NiFe layer thickness at 25 nm. The Rashba spin Seebeck coefficient has been estimated to be 0.266 {\mu}V/K for 100 nm p-Si, and increases by an order of magnitude to 2.11 {\mu}V/K for 5 nm p-Si. The measured…
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