Study of nitrogen ion doping of titanium dioxide films
Raul Ramos, Diego Scoca, Rafael Borges Merlo, Francisco Chagas, Marques, Fernando Alvarez, Luiz Fernando Zagonel

TL;DR
This paper investigates nitrogen ion doping of titanium dioxide thin films to enhance their properties as transparent conducting oxides, demonstrating effective doping control and promising electrical and optical characteristics for TCO applications.
Contribution
It introduces a low-energy nitrogen ion implantation method for doping TiO2 films, enabling high doping levels without compromising film structure.
Findings
Achieved up to 30 at% nitrogen concentration at the surface.
Obtained resistivity of about 0.3 Ω·cm with 85% light transmission.
Carrier density exceeded 10^19 cm^-3 with mobility between 0.1 and 1 cm^2V^-1s^-1.
Abstract
This study reports on the properties of nitrogen doped titanium dioxide thin films considering the application as transparent conducting oxide (TCO). Sets of thin films were prepared by sputtering a titanium target under oxygen atmosphere on a quartz substrate at 400 or 500{\deg}C. Films were then doped at the same temperature by 150 eV nitrogen ions. The films were prepared in Anatase phase which was maintained after doping. Up to 30at% nitrogen concentration was obtained at the surface, as determined by in situ x-ray photoelectron spectroscopy (XPS). Such high nitrogen concentration at the surface lead to nitrogen diffusion into the bulk which reached about 25 nm. Hall measurements indicate that average carrier density reached over with mobility in the range of to . Resistivity about could be obtained with 85%…
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