Simultaneous nanopatterning and reduction of graphene oxide by femtosecond laser pulses
Maren Kasischke, Stella Maragkaki, Sergej Volz, Andreas Ostendorf and, Evgeny L. Gurevich

TL;DR
This paper introduces a fast, one-step femtosecond laser technique to simultaneously nanopattern and reduce graphene oxide, enabling new applications in flexible electronics.
Contribution
The study demonstrates a novel femtosecond laser method for concurrent nanopatterning and reduction of graphene oxide in a single step.
Findings
Periodic structures of reduced graphene oxide form during laser processing.
Laser reduction of GO confirmed by sheet resistance, Raman, and XPS analysis.
Method enables rapid, simultaneous patterning and reduction for electronic applications.
Abstract
This paper presents a novel one-step method for the periodical nanopatterning and reduction of graphene oxide (GO). Self-organized periodic structures of reduced graphene oxide (rGO) appear on GO surfaces upon processing with a femtosecond laser at fluences slightly higher than the fluence needed for reduction of the GO. This indicates that the periodic pattern is formed either simultaneously with or due to the reduction of the GO. The laser-induced reduction of GO was identified by sheet resistance measurements, Raman and X-ray photoelectron spectroscopy. This fast and simple method to both reduce and periodically structure GO offers a variety of possible applications in printed and flexible electronics.
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