Simulation of Thin-TFETs Using Transition Metal Dichalcogenides: Effect of Material Parameters, Gate Dielectric on Electrostatic Device Performance

TL;DR

This paper investigates how different monolayer TMDC materials, alloys, and gate dielectrics influence the electrostatic and tunneling performance of thin TFET devices, combining theoretical modeling with material parameter analysis.

Contribution

It provides a comprehensive simulation study of thin-TFETs using TMDCs, highlighting the impact of material and dielectric choices on device performance.

Findings

Material and dielectric variations significantly affect device characteristics.

Alloying TMDCs can optimize tunneling and switching behavior.

Simulation results guide material selection for improved TFET performance.

Abstract

In recent years, a lot of scientific research effort has been put forth for the investigation of Transition Metal Dichalcogenides (TMDC) and other Two Dimensional (2D) materials like Graphene, Boron Nitride. Theoretical investigation on the physical aspects of these materials has revealed a whole new range of exciting applications due to wide tunability in electronic and optoelectronic properties. Besides theoretical exploration, these materials have been successfully implemented in electronic and optoelectronic devices with promising results. In this work, we have investigated the effect of monolayer TMDC materials and monolayer TMDC alloys on the performance of a promising electronic device that can achieve steep switching characteristics- thin Tunneling Filed Effect Transistor or thin-TFET, using self-consistent determination of conduction, valance band levels in the device and a simplified model of interlayer tunneling current that treats scattering semi-classically and incorporates the energy broadening effect using a Gaussian approximation. We have also explored the effect of gate dielectric material variation, interlayer material variation on the performance of the device.