A Compact Low-Cost Low-Maintenance Open Architecture Mask Aligner for Fabrication of Multilayer Microfluidics Devices
Quang Long Pham, Nhat-Anh N. Tong, Austin Mathew, Roman S. Voronov

TL;DR
This paper presents a low-cost, high-precision, open architecture mask aligner for multilayer microfluidic device fabrication, significantly reducing costs while maintaining accuracy and functionality.
Contribution
The authors developed a custom-built mask aligner that matches commercial features at a fraction of the cost, with detailed fabrication procedures and validation for microfluidic applications.
Findings
Cost of system under $7,500, over ten times cheaper than commercial systems.
Alignment accuracy better than 3 microns.
Successful fabrication of multilayer microfluidic masters.
Abstract
A custom-built mask aligner (CBMA), which fundamentally covers all the key features of a commercial mask aligner, while being low cost, light weight, and having low power consumption and high accuracy is constructed. The CBMA is comprised of a custom high fidelity LED light source, vacuum chuck and mask holder, high-precision translation and rotation stages, and high resolution digital microscopes. The total cost of the system is under $7,500, which is over ten times cheaper than a comparable commercial system. It produces a collimated ultraviolet illumination of 1.8-2.0 mW cm-2 over an area of a standard 4-inch wafer, at the plane of the photoresist exposure; and the alignment accuracy is characterized to be < 3 microns, which is sufficient for most microfluidic applications. Moreover, this manuscript provides detailed descriptions of the procedures needed to fabricate multilayered…
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