Predicting Scattering Scanning Near-field Optical Microscopy of Mass-produced Plasmonic Devices

TL;DR

This paper develops a model to predict and interpret scattering scanning near-field optical microscopy measurements of plasmonic devices, enabling precise sub-diffraction-limited optical characterization crucial for nano-optics and device development.

Contribution

A novel model translating simulated electric fields into expected near-field measurements specific to scattering scanning near-field optical microscopy.

Findings

Model accurately predicts near-field measurements from simulations.

Scattering SNOM can determine sub-diffraction-limited dimensions.

Method enhances metrology for nano-optics and plasmonic devices.

Abstract

Scattering scanning near-field optical microscopy enables optical imaging and characterization of plasmonic devices with nanometer-scale resolution well below the diffraction limit. This technique enables developers to probe and understand the waveguide-coupled plasmonic antenna in as-fabricated heat-assisted magnetic recording heads. In order validate and predict results and to extract information from experimental measurements that is physically comparable to simulations, a model was developed to translate the simulated electric field into expected near-field measurements using physical parameters specific to scattering scanning near-field optical microscopy physics. The methods used in this paper prove that scattering scanning near-field optical microscopy can be used to determine critical sub-diffraction-limited dimensions of optical field confinement, which is a crucial metrology requirement for the future of nano-optics, semiconductor photonic devices, and biological sensing where the near-field character of light is fundamental to device operation.