Critical phases in the raise and peel model
D. A. C. Jara, F. C. Alcaraz

TL;DR
This paper investigates the critical behavior of the raise and peel model (RPM), revealing a conformally invariant point at u=1, a roughness transition, and two distinct critical phases for u>1 with different surface profile properties.
Contribution
The study provides a detailed analysis of the RPM's phase diagram, identifying a conformal invariance point, a roughness transition, and the existence of two separate critical phases for u>1, with insights into their universality classes.
Findings
At u=1, RPM is conformally invariant with critical exponents z=1 and α=0.
For u>1, RPM exhibits two critical phases with different roughness exponents.
At short scales, RPM shows KPZ universality behavior, but differs at large scales.
Abstract
The raise and peel model (RPM) is a nonlocal stochastic model describing the space and time fluctuations of an evolving one dimensional interface. Its relevant parameter is the ratio between the rates of local adsorption and nonlocal desorption processes (avalanches) processes. The model at give us the first example of a conformally invariant stochastic model. For small values the model is known to be noncritical, while for it is critical. By calculating the structure function of the height profiles in the reciprocal space we confirm with good precision that indeed . We establish that at the conformal invariant point the RPM has a roughness transition with dynamical and roughness critical exponents and , respectively. For the model is critical with an -dependent dynamical critical exponent that tends towards zero…
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