Observation of tunneling gap in epitaxial ultrathin films of pyrite-type copper disulfide
Chong Liu, Haohao Yang, Can-Li Song, Wei Li, Ke He, Xu-Cun Ma, Lili, Wang, Qi-Kun Xue

TL;DR
This study uses scanning tunneling microscopy to observe a persistent symmetric tunneling gap in epitaxial ultrathin CuS2 films, revealing novel matter states at the two-dimensional limit.
Contribution
First observation of a tunneling gap in epitaxial ultrathin pyrite-type copper disulfide films grown by molecular beam epitaxy.
Findings
Tunneling gap persists up to ~15 K
Gap degrades with increasing temperature
Gap diminishes with increasing film thickness
Abstract
We report scanning tunneling microscopy investigation on epitaxial ultrathin films of pyrite-type copper disulfide. Layer by layer growth of CuS2 films with a preferential orientation of (111) on SrTiO3(001) and Bi2Sr2CaCu2O8+{\delta} substrates is achieved by molecular beam epitaxy growth. For ultrathin films on both kinds of substrates, we observed symmetric tunneling gap around Fermi level that persists up to ~ 15 K. The tunneling gap degrades with either increasing temperature or increasing thickness, suggesting new matter states at the extreme two dimensional limit.
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