Chemical Bonding in Epitaxial ZrB2 Studied by X-ray Spectroscopy
Martin Magnuson, Lina Tengdelius, Grzegorz Greczynski, Lars Hultman,, and Hans H\"ogberg

TL;DR
This study uses X-ray spectroscopy to analyze the chemical bonding and structural properties of epitaxial ZrB2 films, revealing differences in oxygen content and atomic ordering compared to bulk ZrB2 and α-Zr.
Contribution
It provides detailed spectroscopic and structural insights into epitaxial ZrB2 films, highlighting differences from bulk materials and the effects of oxygen incorporation.
Findings
Epitaxial ZrB2 film shows higher atomic ordering than bulk.
Oxygen content is lower in the epitaxial film compared to bulk ZrB2.
Structural parameters differ slightly between film and bulk ZrB2.
Abstract
The chemical bonding in an epitaxial ZrB2 film is investigated by Zr K-edge (1s) X-ray absorption near-edge structure (XANES) and extended X-ray absorption fine structure (EXAFS) spectroscopies and compared to the ZrB2 compound target from which the film was synthesized as well as a bulk {\alpha}-Zr reference. Quantitative analysis of X-ray Photoelectron Spectroscopy spectra reveals at the surface: ~5% O in the epitaxial ZrB2 film, ~19% O in the ZrB2 compound target and ~22% O in the bulk {\alpha}-Zr reference after completed sputter cleaning. For the ZrB2 compound target, X-ray diffraction (XRD) shows weak but visible -111, 111, and 220 peaks from monoclinic ZrO2 together with peaks from ZrB2 and where the intensity distribution for the ZrB2 peaks show a randomly oriented target material. For the bulk {\alpha}-Zr reference no peaks from any crystalline oxide were visible in the…
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