Characterization of sub-monolayer coatings as novel calibration samples for X-ray spectroscopy
Philipp H\"onicke, Markus Kr\"amer, Lars L\"uhl, Konstantin Andrianov,, Burkhard Beckhoff, Rainer Dietsch, Thomas Holz, Birgit Kanngie{\ss}er, Danny, Wei{\ss}bach, Thomas Wilhein

TL;DR
This paper presents the development and characterization of ultra-thin, sub-monolayer reference samples fabricated via physical vapor deposition for enhanced calibration in X-ray spectroscopy, especially in nanotechnology applications.
Contribution
It introduces novel sub-monolayer reference samples fabricated with PVD techniques and demonstrates their precise characterization using synchrotron radiation, expanding calibration options for XRF methods.
Findings
High precision in manufacturing of sub-monolayer coatings
Versatility of samples for various XRF applications
Confirmed homogeneity and stability of the reference samples
Abstract
With the advent of both modern X-ray fluorescence (XRF) methods and improved analytical reliability requirements the demand for suitable reference samples has increased. Especially in nanotechnology with the very low areal mass depositions, quantification becomes considerably more difficult. However, the availability of suited reference samples is drastically lower than the demand. Physical vapor deposition (PVD) techniques have been enhanced significantly in the last decade driven by the need for extremely precise film parameters in multilayer production. We have applied those techniques for the development of layer-like reference samples with mass depositions in the ng-range and well below. Several types of reference samples were fabricated: multi-elemental layer and extremely low (sub-monolayer) samples for various applications in XRF and total-reflection XRF (TXRF) analysis. Those…
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