Forbidden Backscattering and Resistance Dip in the Quantum Limit as a Signature for Topological Insulators
Yiyuan Chen, Hai-Zhou Lu, and X. C. Xie

TL;DR
This paper proposes that a resistance dip caused by forbidden backscattering in the quantum limit can serve as a bulk signature for topological insulators, providing an accessible transport-based identification method.
Contribution
It introduces a novel bulk transport signature based on forbidden backscattering in the quantum limit, applicable to various topological insulator materials.
Findings
Forbidden backscattering occurs at a critical magnetic field in the quantum limit.
The resistance dip is independent of disorder scattering details.
The theory applies to multiple material families, aiding topological phase identification.
Abstract
Identifying topological insulators and semimetals often focuses on their surface states, using spectroscopic methods such as angle-resolved photoemission spectroscopy or scanning tunneling microscopy. In contrast, studying the topological properties of topological insulators from their bulk-state transport is more accessible in most labs but seldom addressed. We show that, in the quantum limit of a topological insulator, the backscattering between the only two states on the Fermi surface of the lowest Landau band can be forbidden, at a critical magnetic field. The conductivity is determined solely by the backscattering between the two states, leading to a resistance dip that may serve as a signature for topological insulator phases. More importantly, this forbidden backscattering mechanism for the resistance dip is irrelevant to details of disorder scattering. Our theory can be applied…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
