Imaging Pulsed Laser Deposition oxide growth by in-situ Atomic Force Microscopy

TL;DR

This paper presents the development of an in-situ atomic force microscopy system integrated with pulsed laser deposition to visualize oxide film growth in real-time, enabling detailed topographical studies during deposition.

Contribution

The authors designed and implemented a combined AFM-PLD setup capable of real-time surface imaging during oxide film growth at various temperatures and pressures.

Findings

Resolved unit cell height surface steps during growth

Demonstrated in-situ topography imaging under typical PLD conditions

Operated effectively from room temperature to 700°C

Abstract

To visualize the topography of thin oxide films during growth, thereby enabling to study its growth behavior quasi real-time, we have designed and integrated an atomic force microscope (AFM) in a pulsed laser deposition (PLD) vacuum setup. The AFM scanner and PLD target are integrated in a single support frame, combined with a fast sample transfer method, such that in-situ microscopy can be utilized after subsequent deposition pulses. The in-situ microscope can be operated from room temperature (RT) up to 700$^\circ$C and at (process) pressures ranging from the vacuum base pressure of 10$^{-6}$ mbar up to 1 mbar, typical PLD conditions for the growth of oxide films. The performance of this instrument is demonstrated by resolving unit cell height surface steps and surface topography under typical oxide PLD growth conditions.