Effect of RF Sputtering Process Parameters on Silicon Nitride Thin Film Deposition

TL;DR

This study optimizes RF sputtering parameters for silicon nitride thin film deposition, analyzing how power, duration, and gas flows affect film properties like thickness, resistivity, and refractive index.

Contribution

It systematically investigates the influence of key RF sputtering parameters on silicon nitride film quality using Taguchi design, providing insights for process optimization.

Findings

Film thickness ranged from 127.8nm to 908.3nm.

Resistivity varied between 1.53x10^13 and 7.85x10^13 ohm-m.

Refractive index was between 1.84 and 2.08.

Abstract

The objective of this work was to study the RF sputtering process parameters optimisation for deposition of Silicon Nitride thin films. The process parameters chosen to be varied were deposition power, deposition duration, flow rate of argon and flow rate of nitrogen. The parameters were varied at three levels according to Taguchi L9 orthogonal array. Surface topology, film composition, coating thickness, coating resistivity and refractive index were determined using SEM, XRD, profilometer, Semiconductor device analyser and UV spectrometer respectively. The measured film thickness values ranged from 127.8nm to 908.3nm with deposition rate varying from 1.47nm/min to a maximum value of 10.1nm/min. The resistivity of the film varied between 1.53x1013ohm-m to 7.85 x1013ohm-m. Refractive index of the film was calculated to be between 1.84 to 2.08. From the results, it was seen that film properties tend to be poor when there is no nitrogen flow and tend to improve with small input of nitrogen. Also, SEM images indicated amorphous structure of silicon nitride which was confirmed by XRD pattern.