Atomic and electronic structure of doped Si(111)(2root3x2root3)R30(degrees)-Sn interfaces
Seho Yi, Fangfei Ming, Ying-Tzu Huang, Tyler S. Smith, Xiyou Peng,, Weisong Tu, Daniel Mulugeta, Renee D. Diehl, Paul C. Snijders, Jun-Hyung Cho, and Hanno H. Weitering

TL;DR
This study combines experimental and theoretical methods to determine the atomic structure of doped Si(111)-Sn interfaces, revealing two viable models and insights into electron-driven phase transitions relevant for novel electronic surface phases.
Contribution
It introduces a revised trimer model for the doped Si(111)-Sn interface and demonstrates how STS data can distinguish between structural models, advancing understanding of surface phase transitions.
Findings
Tornevik model fits most experimental data
Revised trimer model is a viable alternative
STS data reveal electron-injection-driven phase transformation
Abstract
The hole doped Si(111)(2root3x2root3)R30(degrees)-Sn interface exhibits a symmetry-breaking insulator-insulator transition below 100 K that appears to be triggered by electron tunneling into the empty surface-state bands. No such transition is seen in electron-doped systems. To elucidate the nature and driving force of this phenomenon, the structure of the interface must be resolved. Here we report on an extensive experimental and theoretical study, including scanning tunneling microscopy and spectroscopy (STM/STS), dynamical low-energy electron diffraction (LEED) analysis, and density functional theory (DFT) calculations, to elucidate the structure of this interface. We consider six different structure models, three of which have been proposed before, and conclude that only two of them can account for the majority of experimental data. One of them is the model according to Tornevik et…
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