Spatial symmetry breaking in single-frequency CCP discharge with transverse magnetic field

TL;DR

This paper demonstrates that applying a static transverse magnetic field in a single-frequency CCP plasma device enables independent control of ion flux and energy, improving process precision for industrial applications.

Contribution

It introduces a novel method of using a transverse magnetic field to independently control ion flux and energy in CCP discharges, offering an alternative to dual-frequency systems.

Findings

60% reduction in sheath width

Fourfold increase in ion flux

Enhanced control of ion dynamics

Abstract

An independent control of the flux and energy of ions impacting on an object immersed in a plasma is often desirable for many industrial processes such as microelectronics manufacturing. We demonstrate that a simultaneous control of these quantities is possible by a suitable choice of a static magnetic field applied parallel to the plane electrodes in a standard single frequency capacitively coupled plasma device. Our particle-in-cell simulations show a 60% reduction in the sheath width (that improves control of ion energy) and a four fold increase in the ion flux at the electrode as a consequence of the altered ion and electron dynamics due to the ambient magnetic field. A detailed analysis of the particle dynamics is presented and the optimized operating parameters of the device are discussed. The present technique offers a simple and attractive alternative to conventional dual frequency based devices that often suffer from undesirable limitations arising from frequency coupling and electromagnetic effects.