Plasmon modes in monolayer and double-layer black phosphorus under applied uniaxial strain
S. Saberi-Pouya, T. Vazifehshenas, M. Saleh, M. Farmanbar, T., Salavati-fard

TL;DR
This paper investigates how uniaxial strain influences plasmon modes in monolayer and multilayer black phosphorus, deriving analytical relations and highlighting the importance of strain direction and layer configuration on plasmonic properties.
Contribution
It provides analytical models for strain effects on plasmon dispersions in phosphorene, emphasizing the role of strain direction and layer orientation in controlling plasmonic behavior.
Findings
Strain along armchair direction significantly alters plasmon dispersion.
Layer orientation factor can be used to tune plasmon energies.
Symmetric strain application affects plasmon modes more than asymmetric strain.
Abstract
We study the effects of an applied in-plane uniaxial strain on the plasmon dispersions of monolayer, bilayer and double-layer phosphorene structures in the long-wavelength limit within the linear elasticity theory. In the low energy limit, these effects can be modeled through the change in the curvature of the anisotropic energy band along the armchair and zigzag directions. We derive analytical relations for the plasmon modes under uniaxial strain and show that the direction of the applied strain is important. Moreover, we observe that along the armchair direction, the changes of the plasmon dispersion with strain are different and larger than those along the zigzag direction. Using the analytical relations for two-layer phosphorene systems, we find that the strain-dependent orientation factor of layers could be considered as a means to control the variations of the plasmon energy.…
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