On production and asymmetric focusing of flat electron beams using rectangular capillary discharge plasmas

TL;DR

This paper proposes a novel method using rectangular capillary discharge plasmas for asymmetric focusing of electron beams, leveraging inhomogeneous magnetic fields to improve beam control and flatness.

Contribution

It introduces a new active plasma lensing technique with theoretical modeling and simulations for rectangular capillaries, enabling asymmetric electron beam focusing.

Findings

Theoretical description of plasma and magnetic field parameters.

Magnetohydrodynamic simulations of rectangular capillaries.

Potential for high emittance asymmetry transport and flat electron bunch formation.

Abstract

A method for the asymmetric focusing of electron bunches, based on the active plasma lensing technique is proposed. This method takes advantage of the strong inhomogeneous magnetic field generated inside the capillary discharge plasma to focus the ultrarelativistic electrons. The plasma and magnetic field parameters inside the capillary discharge are described theoretically and modeled with dissipative magnetohydrodynamic computer simulations enabling analysis of the capillaries of rectangle cross-sections. Large aspect ratio rectangular capillaries might be used to transport electron beams with high emittance asymmetries, as well as assist in forming spatially flat electron bunches for final focusing before the interaction point.