Electronic bulk and domain wall properties in B-site doped hexagonal ErMnO$_3$
T. S. Holstad, D. M. Evans, A. Ruff, D. R. Smaabraaten, J. Schaab, Ch., Tzschaschel, Z. Yan, E. Bourret, S. M. Selbach, S. Krohns, and D. Meier

TL;DR
This study investigates how Ti$^{4+}$ B-site doping in hexagonal ErMnO$_3$ influences electronic properties and domain wall conduction, revealing intrinsic domain wall currents and Poole-Frenkel conductance as a key mechanism.
Contribution
It provides new insights into the effects of B-site doping on electronic response and domain wall behavior in hexagonal manganites, an area previously underexplored.
Findings
Ti$^{4+}$ substitutes Mn$^{3+}$ at the B-site as shown by DFT.
Domain wall currents are intrinsic and robust.
Poole-Frenkel conductance dominates electronic transport.
Abstract
Acceptor and donor doping is a standard for tailoring semiconductors. More recently, doping was adapted to optimize the behavior at ferroelectric domain walls. In contrast to more than a century of research on semiconductors, the impact of chemical substitutions on the local electronic response at domain walls is largely unexplored. Here, the hexagonal manganite ErMnO is donor doped with Ti. Density functional theory calculations show that Ti goes to the B-site, replacing Mn. Scanning probe microscopy measurements confirm the robustness of the ferroelectric domain template. The electronic transport at both macro- and nanoscopic length scales is characterized. The measurements demonstrate the intrinsic nature of emergent domain wall currents and point towards Poole-Frenkel conductance as the dominant transport mechanism. Aside from the new insight into the…
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