Suppression of quantum noises in coherent atom lithography through squeezing

TL;DR

This paper demonstrates that quantum noise can hinder superresolution in atom lithography, but squeezing photon number fluctuations effectively suppresses this noise, enhancing pattern visibility beyond the diffraction limit.

Contribution

It introduces the use of photon number squeezing to mitigate quantum noise effects in coherent atom lithography, improving superresolution capabilities.

Findings

Quantum fluctuations reduce superresolution pattern visibility.

Photon squeezing significantly increases pattern visibility.

Squeezing can overcome quantum noise limitations in lithography.

Abstract

The Abbe's diffraction limit restricts the resolution of an optical imaging and lithography system. Coherent Rabi oscillation is shown to be able to overcome the diffraction limit in both optical and atom lithography. In previous studies, semiclassical theory is applied where the driving field is treated as a classical light and quantum fluctuation is neglected. Here, we show that the quantum fluctuation may reduce the visibility of the superresolution pattern. However, by squeezing the photon number fluctuation we are able to significantly increase its visibility.